Hong Kong, China

Chan Kwok Fai Ray

This inventor holds 1 USPTO granted patent. Top assignee: Logitech Europe S.a.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chan Kwok Fai Ray. Retrieved from https://idiyas.com/inventor/chan-kwok-fai-ray

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 25(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Innovations by Chan Kwok Fai Ray

Introduction

Chan Kwok Fai Ray is an accomplished inventor based in Hong Kong, CN. He has made significant contributions to the field of technology, particularly in the design of protective accessories for electronic devices. His innovative spirit is reflected in his patent, which showcases his expertise and creativity.

Latest Patents

Chan holds a patent for a protective cover for a tablet computer. This invention demonstrates his understanding of user needs and the importance of device protection in today's digital age. The patent highlights his ability to merge functionality with design, ensuring that technology remains accessible and safe for users.

Career Highlights

Chan is currently employed at Logitech Europe S.A., a leading company in the technology sector known for its innovative products. His role at Logitech allows him to work on cutting-edge projects that enhance user experience and product reliability. His dedication to his work has positioned him as a valuable asset to the company.

Collaborations

Chan has collaborated with talented individuals such as Yibo Shao and Jean-Marc Fluckiger. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of innovative solutions.

Conclusion

Chan Kwok Fai Ray exemplifies the spirit of innovation through his work and patents. His contributions to the technology industry continue to impact users positively, showcasing the importance of creativity in product development.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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