Pyeongtaek, South Korea

Chan-Hee Lee

This inventor holds 2 USPTO granted patents. Top assignee: Dongwoo Fine-Chem Co., Ltd.. Active years: 2022-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chan-Hee Lee. Retrieved from https://idiyas.com/inventor/chan-hee-lee-jqxte07e

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2022-2025

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2 patents (USPTO):Explore Patents

Title: Innovations of Chan-Hee Lee

Introduction

Chan-Hee Lee is a notable inventor based in Pyeongtaek, South Korea. He has made significant contributions to the field of touch technology, holding a total of 2 patents. His work focuses on enhancing the functionality and design of touch panels and sensors.

Latest Patents

One of his latest patents is for a touch panel having a mesh-typed electrode layer. This innovative touch panel includes a substrate layer and a mesh-typed electrode layer formed on it. The mesh-typed electrode layer features a mesh pattern, with a metal line between nodes configured in a wave shape. Another significant patent is for a touch sensor and method of manufacturing the same. This touch sensor comprises a base layer and an electrode pad portion located in a bezel area of the base layer. The base layer includes recessed portions that are spaced apart along the edge and recessed inward, outside the electrode pad portion.

Career Highlights

Chan-Hee Lee is currently employed at Dongwoo Fine-Chem Co., Ltd. His work at this company has allowed him to develop and refine his innovative ideas in touch technology.

Collaborations

Some of his coworkers include Wonkyu Jung and Kyoung Mo Lee. Their collaboration has likely contributed to the advancements in the projects they have worked on together.

Conclusion

Chan-Hee Lee's contributions to touch technology through his patents demonstrate his innovative spirit and dedication to improving user interaction with devices. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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