Company Filing History:
Years Active: 2012
Title: Innovations of Chaitanya K Ullal
Introduction
Chaitanya K Ullal is an accomplished inventor based in Goettingen, Germany. He has made significant contributions to the field of polymer science through his innovative patent. His work focuses on advancing the synthesis of 3-dimensionally patterned polymer particles, which has important applications in various industries.
Latest Patents
Chaitanya K Ullal holds a patent for the "Stop flow interference lithography system." This system is designed for high throughput synthesis of 3-dimensionally patterned polymer particles. It includes a microfluidic channel containing a stationary oligomer film and a phase mask located adjacent to the microfluidic channel. A source of collimated light is provided to pass through the phase mask and into the microfluidic channel for interaction with the oligomer. The passage of the collimated light through the phase mask generates a 3-dimensional distribution of light intensity, which induces crosslinking of the oligomer in high intensity regions, thereby forming intricate 3-dimensional structures. Chaitanya has 1 patent to his name.
Career Highlights
Chaitanya K Ullal is affiliated with the Massachusetts Institute of Technology, where he continues to push the boundaries of research in his field. His innovative approach to polymer synthesis has garnered attention and respect within the scientific community.
Collaborations
Chaitanya has collaborated with notable colleagues such as Edwin Lorimer Thomas and Patrick Seamus Doyle. These collaborations have further enriched his research and contributed to the advancement of technology in polymer science.
Conclusion
Chaitanya K Ullal's contributions to the field of polymer science through his innovative patent demonstrate his commitment to advancing technology. His work not only showcases his ingenuity but also has the potential to impact various applications in the industry.