The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2012
Filed:
Jul. 16, 2009
Edwin L. Thomas, Natick, MA (US);
Patrick Seamus Doyle, Boston, MA (US);
Dhananjay Dendukuri, Begumpet, IN;
Ji-hyun Jang, Cambridge, MA (US);
Chaitanya K. Ullal, Goettingen, DE;
Edwin L. Thomas, Natick, MA (US);
Patrick Seamus Doyle, Boston, MA (US);
Dhananjay Dendukuri, Begumpet, IN;
Ji-Hyun Jang, Cambridge, MA (US);
Chaitanya K. Ullal, Goettingen, DE;
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
Stop flow interference lithography system for high throughput synthesis of 3-dimensionally patterned polymer particles. The system includes a microfluidic channel containing a stationary oligomer film and a phase mask located adjacent to the microfluidic channel. A source of collimated light is provided for passing the collimated light through the phase mask and into the microfluidic channel for interaction with the oligomer. The passage of the collimated light through the phase mask generates a 3-dimensional distribution of light intensity to induce crosslinking of the oligomer in high intensity regions thereby forming 3-dimensional structures.