This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 834,513 Years Active: 2000
Title: Innovations of Chai-Hao Chang
Introduction
Chai-Hao Chang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of plasma technology, particularly through his innovative patent.
Latest Patents
Chai-Hao Chang holds a patent for an "Inductively-coupled high density plasma producing apparatus and plasma." This invention relates to an inductively-coupled high density plasma producing apparatus and a plasma processing equipment that incorporates this apparatus. The plasma processing equipment consists of a shape-adjustable coil (antenna), a RF power generator, an impedance matching network, a plasma chamber, a gas supply system, and a vacuum system. The gases for producing plasma are fed into the plasma chamber, and the RF power is supplied to the coil to generate plasma within the chamber. This invention is characterized by the provision of a shape-adjustable coil, which allows for the shaping of the RF power profile in the plasma chamber, enabling control over the plasma density profile and its uniformity. Chai-Hao Chang has 1 patent to his name.
Career Highlights
Chai-Hao Chang has established himself as a key figure in the development of plasma technology. His work has implications for various applications, including semiconductor manufacturing and materials processing. His innovative approach to plasma generation has the potential to enhance the efficiency and effectiveness of plasma processing equipment.
Collaborations
Chai-Hao Chang has collaborated with notable colleagues in his field, including Keh-Chyang Leou and Szu-Che Tsai. These collaborations have contributed to the advancement of plasma technology and the successful development of innovative solutions.
Conclusion
Chai-Hao Chang is a distinguished inventor whose work in plasma technology has led to significant advancements in the field. His innovative patent demonstrates his commitment to enhancing plasma processing capabilities. His contributions continue to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile