Lakewood, NJ, United States of America

Chad Joldersma

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignees: Nitto Incorporated, Nitto-Denko Corporation. Active years: 2025.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Chad Joldersma: Innovator in Moisture Barrier Technology

Introduction

Chad Joldersma is an accomplished inventor based in Lakewood, NJ (US). He has made significant contributions to the field of moisture barrier materials, showcasing his innovative spirit and technical expertise. With a focus on creating effective solutions, Joldersma has developed a unique patent that addresses specific industry needs.

Latest Patents

Chad Joldersma holds a patent for a moisture barrier material. This innovative material includes a carrier, an adhesive layer formed on at least one surface of the carrier, and a release treated liner. Notably, the moisture barrier material has a non-planar shape, which enhances its functionality and application in various settings. He has 1 patent to his name.

Career Highlights

Throughout his career, Joldersma has worked with notable companies, including Nitto Incorporated and Nitto-Denko Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in material technology. His work has been instrumental in developing products that meet the demands of modern applications.

Collaborations

Chad Joldersma has collaborated with various professionals in his field, including his coworker Derek Jorgensen. These partnerships have fostered an environment of innovation and creativity, leading to the development of cutting-edge solutions in moisture barrier technology.

Conclusion

Chad Joldersma is a notable inventor whose work in moisture barrier materials has made a significant impact in the industry. His innovative approach and dedication to improving material technology continue to inspire others in the field.

Profile summary based on public USPTO records.
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