This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Chad Eric Mair: Innovator in Electrostatic Chuck Technology
Introduction
Chad Eric Mair is a notable inventor based in Dripping Springs, TX (US). He has made significant contributions to the field of electrostatic chuck technology, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of substrate support assemblies.
Latest Patents
Chad Eric Mair holds a patent for a "Substrate support assembly with multiple discs." This invention outlines a method for bonding components of an electrostatic chuck. The process involves applying a first melting point depressing layer (MDL) to the bottom surface of a first puck plate, which includes functional elements of the electrostatic chuck. A second MDL is then applied to the top surface of a second puck plate, also containing functional elements. A metal interlayer is positioned between the two MDLs. The assembly is heated to a temperature near the eutectic temperature of the MDLs to thermally bond the components together.
Career Highlights
Chad Eric Mair is currently employed at Applied Materials, Inc., where he continues to develop innovative solutions in the semiconductor industry. His expertise in electrostatic chuck technology has positioned him as a valuable asset to his team and the company.
Collaborations
Chad has collaborated with Arvinder Manmohan Singh Chadha, working together to advance their projects and share insights in their field.
Conclusion
Chad Eric Mair's contributions to electrostatic chuck technology through his patent demonstrate his commitment to innovation and excellence in the semiconductor industry. His work continues to influence advancements in this critical area of technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
