Cecilia Y Mak

Title: Cecilia Y Mak: Innovator in Porous Film Technology

Introduction

Cecilia Y Mak is a prominent inventor based in Bedminster, NJ (US). She holds a total of 4 patents that showcase her expertise in the field of materials science and semiconductor technology. Her innovative approaches have significantly contributed to advancements in the deposition of porous films.

Latest Patents

One of her latest patents is a method for depositing porous silica and doped silica films. This processing method employs a cyclic scheme where each cycle involves codepositing silica with silicon, followed by the selective removal of silicon to create a porous structure. The preferred embodiment utilizes plasma enhanced chemical vapor deposition for the codeposition process. After the codeposition, the codeposit is treated with a selective silicon removal reagent, which preferentially eliminates silicon, resulting in a porous structure. This method allows for the formation of porous films with highly uniform small pores and a desired porosity profile, making it advantageous for low-k dielectrics in semiconductor integrated circuit fabrication.

Career Highlights

Cecilia has worked with notable companies, including Lucent Technologies Inc. Her career reflects a commitment to innovation and excellence in her field.

Collaborations

Throughout her career, Cecilia has collaborated with esteemed colleagues such as Kam S Law and Charles H Henry. Their combined expertise has furthered the development of advanced technologies in porous film deposition.

Conclusion

Cecilia Y Mak's contributions to the field of porous film technology are noteworthy. Her innovative methods and collaborative efforts continue to influence advancements in semiconductor fabrication.