Cecil T Ho

Title: Cecil T. Ho: Innovator in Electron Beam Technology

Introduction

Cecil T. Ho is a distinguished inventor based in Poughkeepsie, NY, with a remarkable portfolio of innovations that has earned him six patents to date. His groundbreaking work primarily focuses on advancing electron beam projection/deflection systems, and he operates at the forefront of research and development at the International Business Machines Corporation.

Latest Patents

Cecil's most recent patents demonstrate significant advancements in lithography and electron beam technology. One of his notable inventions is the "Registration of patterns formed of multiple fields," which involves a sophisticated method to align and expose patterns using a lithography system. This innovation enables the formation of chips that exceed the dimensions of the deflection field by employing a mosaic pattern to correct for any orientation discrepancies that may arise from previously applied patterns on the substrate. The method also accounts for errors associated with height, ensuring precision even when the beam does not land perpendicularly on the target. He describes two basic procedures within this patent: the '3-mark' method, which is specific to 2x2 arrays, and the 'MxN' procedure, which can be applied more generally with slightly reduced accuracy.

Another significant contribution from Cecil is the patent for "Dynamic compensation of non-linear electron beam landing angle." This invention describes a dynamic correction arrangement for electron beam systems, offering high-order correction values for deflection based on a correction equation. By calibrating a small number of test points, the coefficients of this equation can be determined, leading to real-time corrections stored in a look-up table or computed via a math co-processor. This innovation addresses landing angle errors up to the third order in telecentric projection and deflection systems, enhancing overall accuracy in applications involving variable axis immersion lenses.

Career Highlights

Cecil's dedication to innovation in his field is evident through his ongoing work at IBM. His contributions significantly impact the efficiency and reliability of electron beam technologies, empowering advancements in various applications within the semiconductor industry.

Collaborations

Throughout his career, Cecil has collaborated with esteemed colleagues, including Donald E. Davis and Edward V. Weber. Together, they have contributed to pushing the boundaries of technology and furthering developments in electron beam systems.

Conclusion

Cecil T. Ho's extensive body of work and his innovative spirit have made him a pivotal figure in the realm of electron beam technology. His patents not only enhance the capabilities of modern lithography systems but also lay the groundwork for future technological advancements in semiconductor manufacturing. As the industry continues to evolve, Charles's contributions will remain central to its progress.