Singapore, Singapore

Casthri Krishnamurthy

This inventor holds 2 USPTO granted patents. Top assignee: Delta Electronics Int'l (Singapore) Pte Ltd. Active years: 2021-2026.


% Patents Active = 50.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2021-2026

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2 patents (USPTO):Explore Patents

Title: The Innovations of Casthri Krishnamurthy

Introduction

Casthri Krishnamurthy is a notable inventor based in Singapore, recognized for his contributions to the field of biotechnology. He has developed innovative solutions that enhance the efficiency of various scientific processes. His work is particularly significant in the realm of molecular biology.

Latest Patents

Krishnamurthy holds a patent for an "Additive composition used in LAMP reaction." This invention involves an additive composition utilized in loop-mediated isothermal amplification (LAMP) reactions. The composition aims to reduce the threshold time for a positive sample and includes components such as EDTA, EGTA, BSA, DMSO, nonionic surfactants, and polymers. The versatility of this additive composition allows for various combinations of these components to optimize LAMP reactions.

Career Highlights

Currently, Casthri Krishnamurthy is employed at Delta Electronics International (Singapore) Pte Ltd. His role at the company allows him to apply his innovative ideas in practical settings, contributing to advancements in technology and science. His expertise in the field has made him a valuable asset to his team.

Collaborations

Throughout his career, Krishnamurthy has collaborated with talented individuals such as Junxin Liang and Shuwen An. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Casthri Krishnamurthy's work exemplifies the spirit of innovation in biotechnology. His patent for an additive composition in LAMP reactions showcases his commitment to improving scientific methodologies. His contributions continue to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
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