Location History:
- Sugarhill, GA (US) (2003 - 2006)
- San Jose, CA (US) (2002 - 2008)
Company Filing History:
Years Active: 2002-2008
Title: Cary Regulski: Innovator in Chemical Mechanical Polishing
Introduction
Cary Regulski is a notable inventor based in San Jose, California. He has made significant contributions to the field of chemical mechanical polishing, particularly in the development of innovative slurries for polishing copper and associated materials. With a total of six patents to his name, Regulski's work has had a substantial impact on the industry.
Latest Patents
Regulski's latest patents include a chemical mechanical polishing slurry and method designed for polishing copper, barrier material, and dielectric material. This invention features two distinct slurries: the first slurry exhibits a high removal rate on copper while maintaining a low removal rate on barrier material. Conversely, the second slurry is engineered to have a high removal rate on barrier material and a low removal rate on copper and dielectric material. Both slurries can incorporate silica particles, an oxidizing agent, a corrosion inhibitor, and a cleaning agent. Another significant patent involves a chemical mechanical polishing slurry composition that also comprises first and second-step slurries, designed with similar removal rate characteristics.
Career Highlights
Cary Regulski is currently employed at Advanced Technology Materials, Inc., where he continues to innovate in the field of chemical mechanical polishing. His expertise and dedication have led to the successful development of advanced polishing compositions that enhance the efficiency and effectiveness of the polishing process.
Collaborations
Throughout his career, Regulski has collaborated with esteemed colleagues such as Thomas H. Baum and William A. Wojtczak. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Cary Regulski's contributions to the field of chemical mechanical polishing are noteworthy and impactful. His innovative patents and collaborative efforts continue to advance the industry, showcasing his commitment to excellence in technology and materials science.