Company Filing History:
Years Active: 2016
Title: Innovations of Carlos Ruiz-Vargas
Introduction
Carlos Ruiz-Vargas is a prominent inventor based in Ithaca, NY. He is known for his contributions to the field of graphene technology. His innovative work has led to the development of a unique method for fabricating graphene devices.
Latest Patents
Carlos holds a patent for "Transfer-free batch fabrication of single layer graphene devices." This patent describes a method of manufacturing one or more graphene devices. It involves forming a thin film growth substrate directly on a device substrate. Graphene is then formed on this thin film growth substrate. The patent also discloses a transistor that includes a device substrate, a source, and a drain, with a single layer graphene channel coupling them. Additionally, it features a gate aligned with the SLG channel and a gate insulator positioned between the gate and the SLG channel. Integrated circuits and other apparatuses utilizing this technology are also covered in the patent.
Career Highlights
Carlos Ruiz-Vargas is affiliated with Cornell University, where he continues to advance research in graphene technology. His work has garnered attention for its potential applications in electronics and materials science. He has been instrumental in pushing the boundaries of what is possible with graphene.
Collaborations
Carlos has collaborated with notable colleagues such as Jiwoong Park and Mark Philip Levendorf. These partnerships have contributed to the advancement of research in the field of graphene and its applications.
Conclusion
Carlos Ruiz-Vargas is a significant figure in the realm of graphene innovation. His patent and ongoing research at Cornell University highlight his commitment to advancing technology in this exciting field.