Barcelona, Spain

Carlos Felip

This inventor holds 1 USPTO granted patent. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Carlos Felip. Retrieved from https://idiyas.com/inventor/carlos-felip

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Carlos Felip: Innovator in Substrate Permeability Assessment

Introduction

Carlos Felip is a notable inventor based in Barcelona, Spain. He has made significant contributions to the field of substrate permeability assessment. His innovative work focuses on determining the characteristics of substrates through image analysis.

Latest Patents

Carlos holds a patent titled "Substrate permeability assessment based on an image." This patent involves methods for assessing substrate permeability by analyzing images to identify voids and repeating patterns. The technology can also predict whether printing fluid will pass through the substrate during printing processes.

Career Highlights

Carlos Felip is currently employed at Hewlett-Packard Development Company, L.P. His work at HP has allowed him to explore and develop advanced imaging techniques that enhance printing technologies. He has successfully integrated his patent into practical applications within the company.

Collaborations

Carlos has collaborated with talented coworkers, including Xavier Domingo Reguant and Oriol Moliner Rafa. Their combined expertise has contributed to the advancement of substrate assessment technologies.

Conclusion

Carlos Felip's innovative work in substrate permeability assessment showcases his dedication to improving printing technologies. His contributions are valuable to the field and highlight the importance of image analysis in practical applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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