Sunnyvale, CA, United States of America

Carl Dunham

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Carl Dunham. Retrieved from https://idiyas.com/inventor/carl-dunham

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Carl Dunham

Introduction

Carl Dunham is a notable inventor based in Sunnyvale, CA (US). He has made significant contributions to the field of gas distribution technology. His innovative approach has led to the development of a unique gas distributor that enhances the efficiency of substrate processing chambers.

Latest Patents

Dunham holds a patent for a "Gas distributor having directed gas flow and cleaning method." This invention focuses on distributing gas across the surface of a substrate processing chamber. The gas distributor features a hub, a baffle extending radially outward from the hub, and two sets of vanes. The design allows for effective gas flow management, improving the overall performance of the processing chamber.

Career Highlights

Carl Dunham is currently employed at Applied Materials, Inc., where he continues to innovate in the field of semiconductor manufacturing. His work has been instrumental in advancing technologies that support the production of high-quality electronic components.

Collaborations

Dunham has collaborated with talented coworkers such as Padmanabhan Krishnaraj and Laxman Murugesh. Their combined expertise has contributed to the successful development of various projects within the company.

Conclusion

Carl Dunham's contributions to gas distribution technology exemplify the spirit of innovation in the semiconductor industry. His patent and ongoing work at Applied Materials, Inc. highlight his commitment to advancing technology for better manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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