Carey Phelps

Title: Carey Phelps: Innovator in Overlay Measurement Technology

Introduction

Carey Phelps is a notable inventor based in Hillsboro, OR (US). She has made significant contributions to the field of overlay measurement technology. With a focus on precision and accuracy, her work has implications for various applications in the semiconductor industry.

Latest Patents

Carey Phelps holds a patent for a "Target and algorithm to measure overlay by modeling back scattering electrons on overlapping structures." This innovative patent describes an overlay target that includes a grating-over-grating structure. The design features a bottom grating structure disposed on a specimen and a top grating structure placed on the bottom grating structure. Additionally, the overlay target includes a calibration scan location that features the bottom grating structure but not the top grating structure, as well as an overlay scan location that includes both the top and bottom grating structures. This invention enhances the accuracy of overlay measurements, which is crucial for the manufacturing of advanced semiconductor devices.

Career Highlights

Carey Phelps is currently employed at Kla Corporation, a leading company in the field of semiconductor process control and metrology. Her role at Kla Corporation allows her to apply her expertise in overlay measurement technology to develop innovative solutions for the industry.

Collaborations

Throughout her career, Carey has collaborated with talented individuals such as Nadav Gutman and Oliver Ache. These collaborations have fostered an environment of innovation and have contributed to the advancement of technology in her field.

Conclusion

Carey Phelps is a pioneering inventor whose work in overlay measurement technology has made a significant impact on the semiconductor industry. Her innovative patent and contributions to Kla Corporation highlight her dedication to advancing technology and precision in manufacturing processes.