Schaffhausen, Switzerland

Cansel Isilki

This inventor holds 1 USPTO granted patent. Top assignee: Occlutech Gmbh. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Cansel Isilki. Retrieved from https://idiyas.com/inventor/cansel-isilki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Cansel Isilki and the Occluder with Stretchable Waist.

Introduction

Cansel Isilki is an inventor based in Schaffhausen, Switzerland, and is associated with Occlutech GmbH. His patent work includes a device designed to address structural heart defects.

Latest Patents

Isilki is named on 1 patent, titled “Occluder with Stretchable Waist.” The invention describes an occluder with a tubular interlaced structure whose pitch varies along its axial length. It includes proximal and distal elements connected by an intermediate element.

One aspect places at least one transition between pitches closer to the intermediate element than to the outer circumference of a proximal or distal element when the occluder is relaxed. Another aspect allows the device to extend axially from its relaxed state, with a load-to-extension ratio below about 0.75 N/mm when extended by at least 2 mm.

Career Highlights

The patent identifies Isilki’s contribution to the development of an occluder intended for structural heart defect treatment. The available information associates him with Occlutech GmbH.

Collaborations

Gareth Morgan and Secil Soyutemiz are listed as Isilki’s coworkers. The patent information provided does not specify their individual roles in the invention.

Conclusion

Cansel Isilki’s patent work reflects an engineering approach to occluder design, focusing on a variable-pitch structure and controlled axial extension for structural heart defect applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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