Sylvania, OH, United States of America

Calvin Columbus Nichols

This inventor holds 1 USPTO granted patent. Top assignee: Visteon Global Technolgoies, Inc.. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Calvin Columbus Nichols. Retrieved from https://idiyas.com/inventor/calvin-columbus-nichols

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: The Innovations of Calvin Columbus Nichols

Introduction

Calvin Columbus Nichols is an accomplished inventor based in Sylvania, OH (US). He has made significant contributions to the field of technology, particularly through his innovative patent work. His dedication to advancing technology is evident in his professional endeavors.

Latest Patents

Calvin holds a patent for a "Method of forming a partially covered panel." This invention showcases his ability to create practical solutions that can be applied in various industries. With 1 patent to his name, he continues to demonstrate his inventive spirit.

Career Highlights

Calvin is currently employed at Visteon Global Technologies, Inc., where he applies his expertise in technology and innovation. His role at the company allows him to work on cutting-edge projects that contribute to the advancement of automotive technologies.

Collaborations

Calvin collaborates with talented individuals such as Aaron Stanley Wisniewski and Talavane Suryanarayan. These partnerships enhance his work and foster a creative environment that encourages innovation.

Conclusion

Calvin Columbus Nichols is a notable inventor whose contributions to technology are marked by his patent and collaborative efforts. His work at Visteon Global Technologies, Inc. reflects his commitment to innovation and excellence in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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