This inventor holds 1 USPTO granted patent and 2 published patent applications and 2 EPO patents. Top assignee: Basf Se Corporation. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Innovations of Cai An Wang in Polyurethane Foam Technology
Introduction
Cai An Wang is a notable inventor based in Shanghai, China. He has made significant contributions to the field of polyurethane foam technology. His innovative work focuses on creating materials that enhance performance in various applications, particularly in footwear.
Latest Patents
Cai An Wang holds a patent for a unique invention titled "Low density polyurethane foam systems with high split tear." This invention describes a polyurethane foam produced in a 'one shot process' that has low density, is semi-hard, and displays a high rebound value. The foam provides superior split tear performance, making it ideal for use in shoe soles, midsoles, or insoles. This technology can be utilized to create outer soles for sandal-type shoes, midsoles for athletic shoes, or insoles for any type of footwear.
Career Highlights
Cai An Wang is associated with BASF SE Corporation, a leading company in the chemical industry. His work at BASF has allowed him to develop innovative solutions that address the needs of the footwear market. His expertise in polyurethane foam systems has positioned him as a key player in this specialized field.
Collaborations
Cai An Wang collaborates with talented individuals such as Ren Zheng Zhang and Chang Xi Li. These partnerships enhance the creative process and contribute to the development of advanced materials in the industry.
Conclusion
Cai An Wang's contributions to polyurethane foam technology exemplify the impact of innovation in the footwear industry. His patented work not only improves product performance but also showcases the potential of advanced materials in everyday applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
