C Thomas Avedisian

Title: C Thomas Avedisian: Innovator in Chemical Vapor Deposition Technology

Introduction

C Thomas Avedisian is a notable inventor based in Ithaca, NY (US). He has made significant contributions to the field of chemical vapor deposition (CVD) technology. His innovative approach has led to advancements that enhance the efficiency and effectiveness of CVD processes.

Latest Patents

Avedisian holds a patent for a "Method and apparatus for CVD using liquid delivery system." This patent describes a liquid delivery system for a CVD apparatus that utilizes one or more ultrasonic atomizing nozzles. These nozzles inject liquid precursor solutions directly into a CVD reactor chamber. The system can operate in either continuous or pulsed mode, allowing for precise control of film deposition rates, achieving as fine as monolayers per pulse. The use of ultrasonic nozzles ensures that the liquid is vaporized within the reactor chamber, resulting in uniform film deposition on substrates.

Career Highlights

Avedisian is affiliated with Cornell University, where he continues to engage in research and development in the field of chemical engineering. His work has been instrumental in advancing CVD technologies, which are critical in various applications, including semiconductor manufacturing and materials science.

Collaborations

Some of his notable coworkers include Vera A Versteeg and Rishi Raj. Their collaborative efforts contribute to the ongoing research and innovation within the field.

Conclusion

C Thomas Avedisian's contributions to chemical vapor deposition technology exemplify the impact of innovative thinking in engineering. His patent and work at Cornell University highlight the importance of advancements in this critical area of research.