C Randall Harwood

Title: Innovations by C Randall Harwood

Introduction

C Randall Harwood is an accomplished inventor based in Tempe, AZ (US). He has made significant contributions to the field of chemical mechanical polishing (CMP) through his innovative patents. With a total of 2 patents, Harwood has focused on enhancing the efficiency and effectiveness of slurry recycling processes.

Latest Patents

Harwood's latest patents include "Rinse Water Recycling in CMP Apparatus" and "Slurry Recycling in CMP Apparatus." Both inventions aim to provide a consistent polishing rate by continuously blending recycled slurry with the slurry in use. The process involves recovering the slurry in a catch ring, which is then fed into a recycle loop. This loop blends the recovered slurry with fresh slurry, rejuvenating chemicals, or water. The blend is tested, filtered, and returned to the polishing pad, ensuring that the volume returned slightly exceeds the volume recovered, causing the catch ring to overflow. Additionally, rinse water is recycled in a similar manner to maintain the polishing pad's moisture between cycles.

Career Highlights

Harwood is currently employed at Integrated Process Equipment Corporation, where he continues to develop innovative solutions in the CMP field. His work has significantly impacted the efficiency of polishing processes, making them more sustainable and effective.

Collaborations

Throughout his career, Harwood has collaborated with notable colleagues, including John Andrew Adams and Gerald A Krulik. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

C Randall Harwood's contributions to the field of CMP through his innovative patents demonstrate his commitment to advancing technology in this area. His work not only enhances the efficiency of polishing processes but also promotes sustainability in the industry.