Company Filing History:
1 out of 136 
1 out of 1,620 
Years Active: 1999-2001
Title: C Randal Howell: Innovator in High-Performance Alloys
Introduction: C Randal Howell is a notable inventor based in Knoxville, TN, USA, recognized for his significant contributions to the development of high-performance alloys. With two patents to his name, he has focused on materials that offer superior durability and resistance to harsh environmental conditions.
Latest Patents: Howell's latest innovations include two patents that showcase his expertise in metallurgy. The first patent is for iron-chromium-silicon alloys, specifically designed for high-temperature oxidation resistance. This alloy features a body-centered cubic structure, making it highly resistant to both oxidation and corrosion. The second patent describes a high-strength, thermally stable, oxidation-resistant nickel-based alloy. This polycrystalline alloy comprises essential components including 15% to 30% molybdenum, 3% to 10% aluminum, and various other elements, ensuring outstanding performance in challenging environments.
Career Highlights: Throughout his career, C Randal Howell has made significant strides in the field of materials science. He has notably worked with prestigious organizations such as Lockheed Martin Energy Research Corporation and Oak Ridge National Laboratory. His research and development efforts have contributed to advancements in alloy technologies that are critical for various industrial applications.
Collaborations: Howell has collaborated with esteemed colleagues, including Vinod Kumar Sikka and Seetharama C Deevi. These collaborations reflect his commitment to advancing knowledge in the field and highlight the importance of teamwork in fostering innovation.
Conclusion: C Randal Howell exemplifies the spirit of innovation in the realm of high-performance alloys. His patents and collaborations showcase his dedication to developing materials that meet the increasing demands of modern engineering applications. Through his work, Howell continues to influence the landscape of materials science, paving the way for future advancements in this critical field.