This inventor holds 1 USPTO granted patent. Top assignee: Thiokol Corporation. Active years: 1993.
Company Filing History:
Years Active: 1993
Title: C Lamont Hislop: Innovator in Plasma Cleaning Technology
Introduction
C Lamont Hislop is a notable inventor based in Clearfield, UT (US). He has made significant contributions to the field of surface cleaning technology through his innovative patent. His work focuses on utilizing plasma technology to enhance cleaning processes.
Latest Patents
Hislop holds a patent for a "Method and apparatus for cleaning surfaces with plasma." This invention involves a device designed to clean surfaces by introducing a highly reactive gas mixture. The gas mixture may include excited species such as ozone, along with related excited ions, atoms, and electrons. The process oxidizes undesirable materials on the surface, making it an effective cleaning solution.
Career Highlights
Hislop is associated with Thiokol Corporation, where he has applied his expertise in developing advanced cleaning technologies. His innovative approach has led to the creation of a device that includes a structure defining an enclosed space when placed against the surface to be cleaned. The device features electrodes positioned within it, allowing for an electrical discharge that excites the selected gas species. This technology represents a significant advancement in surface cleaning methods.
Collaborations
Hislop has worked alongside notable colleagues such as Ernest E Rogers and Blaine A Frandsen. Their collaborative efforts have contributed to the development of cutting-edge technologies in their field.
Conclusion
C Lamont Hislop's contributions to plasma cleaning technology exemplify the innovative spirit of modern inventors. His patent reflects a commitment to improving cleaning processes through advanced scientific methods. His work continues to influence the industry and pave the way for future innovations.