C K Lau

Title: C K Lau: Innovator in MOSFET Technology

Introduction

C K Lau is a prominent inventor based in Singapore, known for his contributions to the field of semiconductor technology. With a focus on enhancing the performance of MOSFET devices, Lau has developed innovative methods that address critical challenges in the industry. His work has led to the filing of 2 patents, showcasing his expertise and commitment to advancing technology.

Latest Patents

Lau's latest patents include a groundbreaking process flow for a performance-enhanced MOSFET with a self-aligned, recessed channel. This method alleviates issues related to short channel and hot carrier effects while reducing inter-electrode capacitance. The process involves several intricate steps, including the growth of a thin pad oxide layer, deposition of a thick silicon nitride layer, and the formation of a tapered oxide layer along the sidewalls of the gate recess. The fabrication of the MOS transistor device is completed through a series of implantations, metallization, and passivation, resulting in a highly efficient MOSFET.

Career Highlights

Throughout his career, C K Lau has worked with notable organizations, including Chartered Semiconductor Manufacturing Ltd and the National University of Singapore. His experience in these institutions has allowed him to collaborate with leading experts in the field and contribute to significant advancements in semiconductor technology.

Collaborations

Lau has collaborated with several professionals, including Sneedharan Pillai Sneelal and Alex See. These partnerships have further enriched his work and expanded the impact of his innovations in the industry.

Conclusion

C K Lau's contributions to MOSFET technology exemplify his dedication to innovation and excellence in the semiconductor field. His patents and career achievements reflect a commitment to solving complex engineering challenges and advancing the capabilities of electronic devices.