C B Shepard, Jr

Title: C B Shepard, Jr: Innovator in Plasma Jet Technology

Introduction

C B Shepard, Jr. is a notable inventor based in Laguna Niguel, California. He has made significant contributions to the field of plasma jet technology, holding two patents that showcase his innovative approach to chemical vapor deposition (CVD) systems.

Latest Patents

One of his latest patents is for a plasma jet system. This system includes gas injectors and a stand-off ring designed to optimize the mixing of hydrocarbons and atomic hydrogen. The gas injectors feature outlet holes that are flared to maintain a consistent flow, preventing the entrapment of atomic hydrogen. The counter-rotational arrangement of the injectors enhances the uniformity of the mixture, while the stand-off ring allows cooler gases to enter the nozzle, reducing the temperature of the injectors and minimizing the risk of cracking. Additionally, a new injector design method ensures optimal mixing characteristics across various recipes.

Another significant patent is for a gas injection disc assembly for CVD applications. This assembly consists of an outer ring and a tubular modular insert. The outer ring has a ring-shaped plenum and gas feed paths that connect to gas supply tubes. The insert contains radially aligned injectant holes and is designed to expand during the CVD process, eliminating gaps that could lead to gas leakage. Once the operation ceases, the insert cools and can be easily removed for cleaning or replacement.

Career Highlights

C B Shepard, Jr. is associated with Celestech, Inc., where he continues to develop innovative technologies in the field of plasma jet systems. His work has contributed to advancements in CVD processes, enhancing efficiency and effectiveness in various applications.

Collaborations

He has collaborated with notable coworkers such as Daniel V Raney and George Quirk, further enriching his contributions to the field.

Conclusion

C B Shepard, Jr. is a distinguished inventor whose work in plasma jet technology has led to significant advancements in chemical vapor deposition systems. His innovative patents reflect his commitment to improving industrial processes and enhancing the efficiency of gas injection systems.