Byunghyun Hwang

Title: Byunghyun Hwang: Innovator in Semiconductor Measurement Technology

Introduction

Byunghyun Hwang is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in measurement methods that enhance the manufacturing process.

Latest Patents

Hwang holds a patent for a semiconductor device measurement method using X-ray scattering. This innovative method involves preparing a semiconductor device with a repeat structure, irradiating it with X-rays to obtain a first X-ray scattering image, and calculating a second X-ray scattering image through simulation. The second image corresponds to a target repeat structure for the semiconductor device. The process includes generating a repeat structure mask by analyzing the position of a signal for a regular repeat structure from the second X-ray scattering image, removing the mask from the first image, and generating an error image. Finally, the error image is analyzed to calculate irregularities in the repeat structure of the semiconductor device.

Career Highlights

Byunghyun Hwang is currently employed at Samsung Electronics Co., Ltd., where he continues to develop and refine semiconductor technologies. His work has been instrumental in advancing the efficiency and accuracy of semiconductor manufacturing processes.

Collaborations

Hwang collaborates with esteemed colleagues, including Jaeyong Lee and Hidong Kwak, who contribute to the innovative environment at Samsung Electronics.

Conclusion

Byunghyun Hwang's contributions to semiconductor measurement technology exemplify the importance of innovation in the electronics industry. His patented methods are paving the way for more precise manufacturing techniques, which are crucial for the advancement of semiconductor devices.