This inventor holds 1 USPTO granted patent. Top assignees: Boe Technology Group Co., Ltd., Chengdu Boe Optoelectronics Technology Co., Ltd.. Active years: 2016.
Company Filing History:

Years Active: 2016
Title: ByungChun Lee: Innovator in Exposure Technology
Introduction
ByungChun Lee is a notable inventor based in Beijing, China. He has made significant contributions to the field of exposure technology, particularly with his innovative exposure machine. His work has garnered attention for its efficiency and effectiveness in the industry.
Latest Patents
ByungChun Lee holds a patent for an exposure machine. This machine comprises a loading frame for placing an object to be exposed and a light source device located at one side of the plane where the loading frame is positioned. The light emitting direction of the light source device is perpendicular to the plane where the object to be exposed is positioned. During exposure, the loading frame does not reflect the light transmitting through the object, thus avoiding stage spots. Additionally, when operated vertically, the exposure machine can achieve bidirectional exposure by adding a single prism to the light source device, greatly improving exposure efficiency. He holds 1 patent.
Career Highlights
Throughout his career, ByungChun Lee has worked with prominent companies in the technology sector. Notably, he has been associated with Chengdu Boe Optoelectronics Technology Co., Ltd. and Boe Technology Group Co., Ltd. His experience in these organizations has contributed to his expertise in exposure technology.
Collaborations
ByungChun Lee has collaborated with several professionals in his field, including Fujiang Jin and Zhong Lu. These collaborations have likely enhanced his innovative capabilities and contributed to the development of his patented technology.
Conclusion
ByungChun Lee is a distinguished inventor whose work in exposure technology has made a significant impact. His innovative exposure machine exemplifies his commitment to improving efficiency in the field. His contributions continue to influence the industry and inspire future innovations.