Suwon-si, South Korea

Byungchan Lee

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byungchan Lee. Retrieved from https://idiyas.com/inventor/byungchan-lee-a02032gj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Byungchan Lee: Innovator in Ring Measurement Technology

Introduction

Byungchan Lee is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of measurement technology, particularly with his innovative approach to determining ring sizes. His work is recognized within the industry, especially through his association with a leading technology company.

Latest Patents

Byungchan Lee holds a patent for a "Ring for measuring ring size." This invention addresses the common challenges faced by individuals when trying to find the correct ring size, providing a practical solution that enhances user experience.

Career Highlights

Lee is currently employed at Samsung Electronics Ltd., a global leader in technology and innovation. His role at Samsung has allowed him to work on cutting-edge projects that push the boundaries of technology and design.

Collaborations

Throughout his career, Byungchan Lee has collaborated with talented individuals such as Youngsoo Kim and Jaehyung Hong. These partnerships have fostered a creative environment that encourages innovation and the development of new ideas.

Conclusion

Byungchan Lee's contributions to ring measurement technology exemplify his commitment to innovation. His work at Samsung Electronics Ltd. and his collaborations with other talented inventors highlight the importance of teamwork in driving technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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