Gunsan, South Korea

Byung Ju Park

This inventor holds 1 USPTO granted patent. Top assignee: Hansol Chemical. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byung Ju Park. Retrieved from https://idiyas.com/inventor/byung-ju-park-ghan3ca3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Byung Ju Park: Inventor in Inkjet-Printed Light-Emitting Devices

Introduction

Byung Ju Park is an inventor associated with Gunsan, South Korea, and Hansol Chemical. His work includes a patent concerning materials and methods for forming electron transport layers in light-emitting devices.

Latest Patents

Park is credited with 1 patent: “Electron transport layer composition for inkjet printing and method for preparing same.” The invention describes a composition containing metal oxide nanoparticles and at least three solvents that differ in one or more properties, including viscosity, polarity, or vapor pressure. It also describes a method for preparing the composition and a light-emitting device with an electron transport layer formed from it.

Career Highlights

Park’s listed patent focuses on adapting electron transport layer materials for inkjet printing. The disclosed combination of nanoparticles and solvents with differing properties is intended for use in manufacturing light-emitting devices.

Collaborations

Park’s listed coworkers include Do Hyeong Kim and So Mang Kim. The patent information provided identifies Hansol Chemical as his company.

Conclusion

Byung Ju Park’s patent work addresses inkjet-printable electron transport layer compositions and their application in light-emitting devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…