Asan, South Korea

Byung-Joo Jo

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byung-Joo Jo. Retrieved from https://idiyas.com/inventor/byung-joo-jo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2019

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Byung-Joo Jo: Innovator in Semiconductor Device Fabrication

Introduction

Byung-Joo Jo is a notable inventor based in Asan-si, South Korea. He has made significant contributions to the field of semiconductor device fabrication. His innovative work has led to the development of a unique apparatus that enhances the efficiency of tape film lamination processes.

Latest Patents

Byung-Joo Jo holds a patent for an "Apparatus for laminating a tape film on a substrate and a system of fabricating a semiconductor device using the same." This invention includes a housing, a substrate holder, a film holder, and an air removal unit. The air removal unit is designed to remove and exhaust air from the housing, facilitating the attachment of the tape film to the substrate. He has 1 patent to his name.

Career Highlights

Byung-Joo Jo is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics industry. His work at Samsung has allowed him to be at the forefront of technological advancements in semiconductor manufacturing.

Collaborations

Throughout his career, Byung-Joo Jo has collaborated with talented individuals such as Youngmin Kim and Jaeyong Park. These collaborations have contributed to the success of his projects and innovations.

Conclusion

Byung-Joo Jo's contributions to semiconductor device fabrication through his innovative patent demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…