Gyeongsangnam, South Korea

Byung Hee Kim

This inventor holds 1 USPTO granted patent. Top assignee: Biotrion Co., Ltd.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byung Hee Kim. Retrieved from https://idiyas.com/inventor/byung-hee-kim-jstyogpv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: The Innovative Journey of Byung Hee Kim

Introduction:

Byung Hee Kim, a pioneering inventor hailing from Gyeongsangnam-do, South Korea, has made significant contributions to the field of technology and innovation.

Latest Patents:

Byung Hee Kim's latest patents focus on advancements in nanotechnology, particularly in the development of graphene-based materials with groundbreaking properties.

Career Highlights:

With a distinguished career spanning over two decades, Byung Hee Kim has held key roles in leading research institutions and universities, driving forward cutting-edge projects in materials science and nanotechnology. His work has been pivotal in shaping the future of electronic devices and renewable energy technologies.

Collaborations:

Byung Hee Kim has collaborated with renowned scientists, engineers, and industry experts on various projects, fostering a culture of innovation and knowledge exchange. His collaborative efforts have led to the successful development of novel technologies with real-world applications.

Conclusion:

In conclusion, Byung Hee Kim's relentless pursuit of innovation and his commitment to pushing the boundaries of scientific discovery have established him as a trailblazer in the field of nanotechnology. His work continues to inspire future generations of inventors and researchers to explore new frontiers in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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