Mountain View, CA, United States of America

Byron C Lee

This inventor holds 1 USPTO granted patent. Top assignee: Arable Labs, Inc.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byron C Lee. Retrieved from https://idiyas.com/inventor/byron-c-lee-5f748nrr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Byron C. Lee: Innovator in Meteorological Technology

Introduction

Byron C. Lee is a notable inventor based in Mountain View, CA (US). He has made significant contributions to the field of meteorological technology, particularly with his innovative patent for a disdrometer. His work is instrumental in advancing the accuracy of weather measurements.

Latest Patents

Byron holds 1 patent for his invention of a disdrometer, a device that measures the rate of precipitation. This invention is crucial for meteorological studies and applications, enhancing our understanding of weather patterns.

Career Highlights

Byron C. Lee is currently employed at Arable Labs, Inc., a company dedicated to providing advanced agricultural technology solutions. His role at Arable Labs allows him to apply his expertise in developing innovative tools that benefit the agricultural sector.

Collaborations

Throughout his career, Byron has collaborated with talented individuals such as Lawrence Adam Wolf and Benjamin Joseph Siegfried. These partnerships have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Byron C. Lee's contributions to meteorological technology through his patent for a disdrometer exemplify his commitment to innovation. His work at Arable Labs, Inc. and collaborations with other professionals further highlight his impact in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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