Yongin-si, South Korea

Byoungsun Na

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Display Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byoungsun Na. Retrieved from https://idiyas.com/inventor/byoungsun-na-un3fbqxp

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Byoungsun Na and Display Device Innovation.

Introduction

Byoungsun Na is an inventor based in Yongin-si, South Korea. His listed patent work concerns display-device design, and he is associated with Samsung Display Co., Ltd.

Latest Patents

The provided information lists one patent for Na: Display device. The invention describes a display panel with pixels, data lines, first gate lines, auxiliary lines, and second gate lines electrically connected to the first gate lines. It also includes two spaced-apart circuit films, each equipped with a gate driver and a data driver. Some first gate lines receive signals from the first gate driver, while others receive signals from the second gate driver; at least some auxiliary lines are positioned between these groups. This arrangement describes how the display’s lines and drivers are organized.

Career Highlights

Na’s listed patent reflects work on display-device architecture, particularly the arrangement of gate lines, auxiliary lines, and circuit-film drivers. The supplied information identifies Samsung Display Co., Ltd. as his company.

Collaborations

The available details associate Na’s patent work with Samsung Display Co., Ltd. No additional collaborators are identified in the information provided.

Conclusion

Byoungsun Na’s listed invention focuses on the organization of display-panel wiring and driver components, representing a contribution to display-device design.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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