This inventor holds 1 USPTO granted patent. Top assignee: Dms Co., Ltd.. Active years: 2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2013
Title: Byoungil Lee: Innovator in Plasma Reactor Technology
Introduction
Byoungil Lee is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of plasma reactor technology, particularly in the area of workpiece de-chucking devices. His innovative approach has led to advancements that enhance the efficiency and effectiveness of plasma reactors.
Latest Patents
Byoungil Lee holds a patent for a workpiece de-chucking device of a plasma reactor designed for dry-cleaning the inside of a reaction chamber. This device also includes an ElectroStatic chuck (ESC) that facilitates the workpiece de-chucking process. The patent outlines a workpiece de-chucking method that utilizes a lifting unit, an inductively coupled plasma (ICP) source power unit, and a controller. The lifting unit is responsible for elevating the workpiece mounted on the ESC, while the ICP source power unit generates a magnetic field in an inductive coil positioned outside a dielectric window. The controller manages the operation by outputting control signals for source power, lifting, and de-chucking.
Career Highlights
Byoungil Lee is currently employed at DMS Co., Ltd., where he continues to develop innovative technologies in the field of plasma reactors. His work has been instrumental in improving the performance and reliability of these systems.
Collaborations
Some of his notable coworkers include Hyeokjin Jang and Sungyong Ko, who contribute to the collaborative efforts at DMS Co., Ltd. Their teamwork fosters an environment of innovation and creativity.
Conclusion
Byoungil Lee's contributions to plasma reactor technology exemplify the spirit of innovation. His patented workpiece de-chucking device represents a significant advancement in the field, showcasing his expertise and commitment to enhancing industrial processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile