This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Hantech Co., Ltd.. Active years: 2011.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2011
Title: Byoung-Moon Hwang: Innovator in Wafer Defect Detection
Introduction
Byoung-Moon Hwang is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the area of wafer defect detection. His innovative approach has led to the development of advanced methods that enhance the efficiency and accuracy of defect identification in wafers.
Latest Patents
Hwang holds a patent for an "Apparatus and method for detecting defects in wafer using line sensor camera." This invention provides a sophisticated apparatus and method for detecting defects in a wafer. The system includes an optical part that radiates infrared light, an image obtaining part that detects the transmitted infrared light, and a conveying part that moves the image obtaining part or the inspection stage. The controller counts pulse signals and issues photographing instructions, while the defect detection part generates an inspection image by combining image signals. This innovative technology is crucial for improving the quality control processes in semiconductor manufacturing.
Career Highlights
Byoung-Moon Hwang has established himself as a key figure in the semiconductor industry. His work at Hantech Co., Ltd. has been instrumental in advancing wafer inspection technologies. Hwang's dedication to research and development has resulted in significant improvements in defect detection methodologies, making him a valuable asset to his company and the industry at large.
Collaborations
Hwang has collaborated with notable colleagues, including U-Seock Moon and Jong-Kyu Han. Their combined expertise has contributed to the successful development of innovative technologies in the field of wafer inspection.
Conclusion
Byoung-Moon Hwang's contributions to wafer defect detection exemplify the impact of innovation in the semiconductor industry. His patented technology not only enhances the efficiency of defect identification but also sets a new standard for quality control in semiconductor manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile