Byeongtaek Bae

Title: Byeongtaek Bae: Innovator in Image Sensor Technology

Introduction

Byeongtaek Bae is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of image sensor technology. His innovative work has led to the development of a unique patent that enhances the functionality of image sensors.

Latest Patents

Byeongtaek Bae holds a patent for an image sensor and a method of manufacturing the same. This patent describes an image sensor that includes a substrate with multiple pixel regions, a first surface, and a second surface opposite the first. The design features a deep device isolation pattern that penetrates the substrate and separates the pixel regions. This pattern includes a first filling pattern adjacent to the second surface, a second filling pattern on the first filling pattern, and a semiconductor pattern positioned between the first filling pattern and the substrate. Additionally, an oxidized semiconductor pattern is placed on the semiconductor pattern, and a side insulating pattern is included between the semiconductor pattern and the substrate. This innovative design allows for direct contact between the semiconductor pattern and the oxidized semiconductor pattern, enhancing the performance of the image sensor.

Career Highlights

Byeongtaek Bae is currently employed at Samsung Electronics Ltd., a leading company in the technology sector. His work at Samsung has allowed him to collaborate with other talented professionals in the field.

Collaborations

One of his notable coworkers is Jonghyeon Noh, with whom he has likely shared insights and expertise in the development of advanced technologies.

Conclusion

Byeongtaek Bae's contributions to image sensor technology exemplify the innovative spirit of modern inventors. His patent reflects a significant advancement in the field, showcasing his dedication to enhancing technological capabilities.