Daejeon, South Korea

Byeongman Lee

This inventor holds 1 USPTO granted patent. Top assignee: Nota, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byeongman Lee. Retrieved from https://idiyas.com/inventor/byeongman-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Byeongman Lee in Deep Learning Models

Introduction

Byeongman Lee is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of deep learning through his innovative patent. His work focuses on enhancing the adaptability of deep learning models to varying input resolutions.

Latest Patents

Byeongman Lee holds a patent titled "Method and system for changing structure of deep learning model based on change in input resolution." This patent discloses a method and system for modifying the structure of a deep learning model in response to changes in the resolution of input data. The process involves generating multiple input data sets with different resolutions, performing inference on each set, and adjusting the model's structure based on the size of the feature maps produced during inference.

Career Highlights

Byeongman Lee is currently employed at Nota, Inc., where he continues to develop innovative solutions in the realm of artificial intelligence and machine learning. His expertise in deep learning has positioned him as a valuable asset in his field.

Collaborations

He collaborates with talented individuals such as Tae-Ho Kim and Jae Woong Yun, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Byeongman Lee's contributions to deep learning through his patent demonstrate his commitment to advancing technology in this rapidly evolving field. His work not only enhances the functionality of deep learning models but also paves the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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