Uiwang, South Korea

Byeong-Yeol Kim

This inventor holds 1 USPTO granted patent. Top assignee: Cheil Industries Inc.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byeong-Yeol Kim. Retrieved from https://idiyas.com/inventor/byeong-yeol-kim-esv2gj96

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Innovations of Byeong-Yeol Kim

Introduction

Byeong-Yeol Kim is a notable inventor based in Uiwang-si, South Korea. He has made significant contributions to the field of materials science, particularly in the area of graphene technology. His innovative approach has led to the development of a unique method for transferring graphene, which has potential applications in various industries.

Latest Patents

Byeong-Yeol Kim holds a patent for a method of transferring graphene. This method involves depositing graphene on a side of at least one metal substrate to create a metal substrate-graphene layer. The process includes stacking a target substrate on the metal substrate-graphene layer and exposing the structure to an electrolysis bath to remove the metal substrate, thereby transferring the graphene onto the target substrate.

Career Highlights

Kim is associated with Cheil Industries Inc., where he continues to work on advancing graphene technologies. His expertise in this area has positioned him as a key figure in the development of innovative materials.

Collaborations

Some of his notable coworkers include Kuanping Gong and Lijie Ci, who have collaborated with him on various projects related to graphene and its applications.

Conclusion

Byeong-Yeol Kim's contributions to graphene technology exemplify the innovative spirit of modern inventors. His work not only enhances our understanding of materials science but also paves the way for future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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