Yongin, South Korea

Byeong Nam Moon

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Display Co., Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byeong Nam Moon. Retrieved from https://idiyas.com/inventor/byeong-nam-moon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Byeong Nam Moon: Inventor in Substrate-Cutting Technology.

Introduction

Byeong Nam Moon is an inventor based in Yongin, South Korea. His work includes an invention for cutting substrates, and he is associated with Samsung Display Co., Ltd. The available information lists 1 patent for him.

Latest Patents

Moon’s listed patent is titled “Stage for Cutting Substrate Including Removable Tube Line and Substrate-Cutting Apparatus Thereof.” It describes a stage with a supporting member that holds a substrate divided into multiple cell areas. A groove line separates the cell areas, and a first tube line fits into the groove, contacts its inner wall, and has an open upper portion. The patent also concerns a substrate-cutting apparatus incorporating the stage.

Career Highlights

Moon’s listed invention addresses the design of equipment for cutting substrates. His association with Samsung Display Co., Ltd. connects his work to a company active in display technology.

Collaborations

The provided information names Seung Kuk Lee and Ki Hong Lim as Moon’s coworkers. It does not specify their roles in the patent or describe particular collaborative projects.

Conclusion

Byeong Nam Moon’s listed patent focuses on a substrate-supporting stage and cutting apparatus, reflecting his contribution to substrate-processing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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