Seongnam, South Korea

Byeong Jae Lee

This inventor holds 1 USPTO granted patent. Top assignee: Naver Cloud Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byeong Jae Lee. Retrieved from https://idiyas.com/inventor/byeong-jae-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Byeong Jae Lee: Mobile Application Security Inventor

Introduction

Byeong Jae Lee is an inventor associated with Seongnam, South Korea, and Naver Cloud Corporation. His work includes a patented approach to detecting forged mobile applications through user identifiers and signature information.

Latest Patents

Lee is associated with 1 patent: “Method and System for Detecting Forgery of Mobile Application by Using User Identifier and Signature Collection.” The method has a client send an application’s signature information and a user identifier, such as a user ID, to a server. The server then lets the application operator decide whether to allow or block authentication based on business circumstances. This approach can detect application forgery flexibly without requiring all signatures to be registered in advance.

Career Highlights

Lee’s patent addresses mobile application authentication and security. It describes a system that gives application operators discretion over authentication decisions while helping identify forged applications.

Collaborations

Lee’s listed coworkers include MunSoo Kwak and Ae Ji Kim. His patent work is associated with Naver Cloud Corporation.

Conclusion

Byeong Jae Lee’s patent presents a flexible method for detecting mobile application forgery by combining application signature information, user identifiers, and operator-controlled authentication decisions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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