Byeong-Hwan Son

Title: Innovations of Byeong-Hwan Son in Semiconductor Technology

Introduction

Byeong-Hwan Son, an accomplished inventor based in Yongin-si, South Korea, has made significant contributions to the field of semiconductor technology. With one patent to his name, he demonstrates a commitment to advancing innovation within his industry.

Latest Patents

Son's notable patent is focused on a photomask used in the fabrication of semiconductor devices. This photomask is designed to include first and second regions that can be effectively transferred onto a semiconductor substrate, which has a step difference. The first and second regions feature distinct mask patterns, with the mask patterns of the first region exhibiting a different shape from those of the second region. Specifically, the second region's mask patterns include concave and convex portions arranged in opposite lateral sections, enhancing the precision and efficiency of semiconductor creation.

Career Highlights

Byeong-Hwan Son is associated with Samsung Electronics Co., Ltd., a leading global company known for its innovations in electronics and technology. His work in this prestigious organization underscores his role in pushing the boundaries of semiconductor fabrication.

Collaborations

Throughout his career, Son has collaborated with esteemed colleagues, including Bong-cheol Kim and Dae-youp Lee. Their collective efforts in research and development have likely contributed to advancements in semiconductor technologies and further innovations in their respective fields.

Conclusion

Byeong-Hwan Son exemplifies the spirit of innovation through his dedicated work in semiconductor technology. His patent, which enhances the process of semiconductor fabrication, showcases his ingenuity and commitment to the field. As the technology landscape continues to evolve, inventors like Byeong-Hwan Son will play a crucial role in shaping the future of the industry.