Butsurin Jinnai

Title: Butsurin Jinnai: Innovator in Plasma Etch Technology

Introduction

Butsurin Jinnai is a notable inventor based in Fremont, CA, who has made significant contributions to the field of plasma etching technology. With a total of 2 patents, Jinnai's work focuses on enhancing the efficiency and effectiveness of etching processes in semiconductor manufacturing.

Latest Patents

Jinnai's latest patents include a "System, method and apparatus for ion milling in a plasma etch chamber." This invention describes a system and method for performing ion milling within a plasma etch system. The design features a plasma etch chamber equipped with multiple process gas sources, a radio frequency bias source, and a controller. The substrate support in this chamber is non-pivoting and non-rotating, allowing for the processing of substrates without mechanical clamps. Additionally, Jinnai has developed a method titled "Waferless auto conditioning," which aims to reduce contamination in etch chambers by converting metal residue deposits into a state with stronger adhesion to chamber surfaces.

Career Highlights

Butsurin Jinnai is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His innovative work has contributed to advancements in etching technologies, which are crucial for the production of integrated circuits.

Collaborations

Throughout his career, Jinnai has collaborated with esteemed colleagues such as Joydeep Guha and Sanket Sant. These collaborations have fostered a productive environment for innovation and development in the field of plasma etching.

Conclusion

Butsurin Jinnai's contributions to plasma etching technology through his patents and work at Lam Research Corporation highlight his role as a key innovator in the semiconductor industry. His inventions continue to influence the efficiency of manufacturing processes, showcasing the importance of innovation in technology.