Company Filing History:
Years Active: 2022-2024
Title: Bushra Afzal: Innovator in Semiconductor Technology
Introduction
Bushra Afzal is a prominent inventor based in Saratoga, California, known for her significant contributions to semiconductor technology. With a total of three patents to her name, she has made remarkable advancements in the field, particularly in methods related to plasma-enhanced chemical vapor deposition.
Latest Patents
One of her latest patents is titled "Plasma-enhanced chemical vapor deposition of carbon hard-mask." This invention outlines a method for depositing a carbon hard-mask material using plasma-enhanced chemical vapor deposition (PECVD). The process involves heating a substrate within a process chamber to temperatures ranging from about 100°C to about 700°C while producing a plasma with an RF power greater than 3 kW. The method also includes flowing a hydrocarbon precursor into the plasma, resulting in the formation of a carbon hard-mask layer at impressive rates exceeding 5,000 layers per minute.
Another notable patent is "Semiconductor processing chamber and methods for cleaning the same." This invention describes a processing chamber that includes a gas distribution member and a metal ring member, along with an isolating assembly that separates the metal ring member from the gas distribution member. The design allows for efficient fluid access into the radial gap between the metal ring member and the inner isolating member, enhancing the cleaning process of the chamber.
Career Highlights
Bushra Afzal is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. Her work focuses on innovative solutions that improve semiconductor processing techniques and equipment.
Collaborations
Throughout her career, Bushra has collaborated with talented individuals such as Vinay K Prabhakar and Juan Carlos Rocha-Alvarez, contributing to the advancement of semiconductor technologies.
Conclusion
Bushra Afzal's innovative work in semiconductor technology, particularly her patents related to plasma-enhanced chemical vapor deposition, showcases her expertise and dedication to the field. Her contributions continue to influence advancements in semiconductor processing, solidifying her position as a key inventor in the industry.