Hamilton, MA, United States of America

Burleigh H Leach

This inventor holds 1 USPTO granted patent. Top assignee: Gte Sylvania Incorporated. Active years: 1980.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Burleigh H Leach. Retrieved from https://idiyas.com/inventor/burleigh-h-leach

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1980

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1 patent (USPTO):Explore Patents

Title: Burleigh H Leach: Innovator in Protective Coating Technology

Introduction

Burleigh H Leach is a notable inventor based in Hamilton, MA (US). He is recognized for his innovative contributions to the field of protective coatings, particularly in the lighting industry. His work has led to advancements that enhance the durability and functionality of lamp products.

Latest Patents

Leach holds a patent for a method of applying a protective coating on lamp envelopes. This method involves holding the lamp horizontally and rotating it while flow-dispensing a liquid coating material onto the glass envelope. The coating is then cured using irradiation, allowing for rapid application and hardening, especially beneficial for photoflash lamps.

Career Highlights

Throughout his career, Burleigh H Leach has been associated with Gte Sylvania Incorporated, where he has made significant contributions to product development. His innovative methods have improved manufacturing processes and product quality in the lighting sector.

Collaborations

Leach has worked alongside notable colleagues such as John E Tozier and Charles C Casale. Their collaborative efforts have contributed to advancements in lighting technology and protective coatings.

Conclusion

Burleigh H Leach's work in developing protective coating methods has had a lasting impact on the lighting industry. His innovative approach continues to influence manufacturing practices and product design.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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