Odawara, Japan

Bunzo Ueda

This inventor holds 2 USPTO granted patents. Top assignees: Konica Corporation, Konishiroku Photo Industry Co., Ltd.. Active years: 1990-1991.


% Patents Active = 100.0

Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1990-1991

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2 patents (USPTO):Explore Patents

Title: The Innovations of Bunzo Ueda

Introduction

Bunzo Ueda is a notable inventor based in Odawara, Japan. He has made significant contributions to the field of photography through his innovative patents. With a total of 2 patents, Ueda has focused on enhancing photographic materials and processes.

Latest Patents

Ueda's latest patents include a silver halide photographic light-sensitive material that features a reflective support with a transmission density of not more than 0.8. This invention aims to prevent degradation of image sharpness when using a reflective support with low transmission density. Another significant patent is for a direct positive-type silver halide photographic material, which includes blue-, green-, and red-sensitive emulsion layers. Each of these layers contains at least two kinds of silver halide emulsion differing in average grain size, ensuring high-quality photographic results.

Career Highlights

Throughout his career, Bunzo Ueda has worked with prominent companies such as Konica Corporation and Konishiroku Photo Industry Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas in photographic technology.

Collaborations

Ueda has collaborated with notable coworkers, including Yasuo Tosaka and Hajime Komatsu. Their combined expertise has contributed to the advancement of photographic materials and methods.

Conclusion

Bunzo Ueda's contributions to the field of photography through his patents demonstrate his innovative spirit and dedication to improving photographic technology. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
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