Nara, Japan

Bunji Miizuno

This inventor holds 1 USPTO granted patent. Top assignee: Panasonic Intellectual Property Management Co., Ltd.. Active years: 2017.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Bunji Miizuno

Introduction

Bunji Miizuno is a notable inventor based in Nara, Japan. He has made significant contributions to the field of plasma processing technology. His work has led to advancements that enhance the efficiency and effectiveness of plasma processing methods.

Latest Patents

One of Bunji Miizuno's key patents is for a plasma processing apparatus and plasma processing method. This innovative apparatus performs plasma processing on a substrate held on a transport carrier, which includes an annular frame and a holding sheet. The apparatus features a process chamber, a process gas supply unit, a decompressing mechanism, and a plasma excitation device that generates plasma within the chamber. Additionally, it includes a stage for loading the transport carrier, a cooling mechanism, and a cover that partially exposes the substrate to plasma. The design also incorporates a correction member that addresses warpage of the frame, ensuring optimal performance.

Career Highlights

Bunji Miizuno is associated with Panasonic Intellectual Property Management Co., Ltd., where he continues to innovate and develop new technologies. His expertise in plasma processing has positioned him as a valuable asset in the field.

Collaborations

Throughout his career, Bunji has collaborated with talented individuals such as Shogo Okita and Tomohiro Okumura. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Bunji Miizuno's contributions to plasma processing technology exemplify the impact of innovative thinking in the field of engineering. His patent for a plasma processing apparatus showcases his commitment to advancing technology and improving processes.

Profile summary based on public USPTO records.
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