Utica, MI, United States of America

Buddie R Dotter, Ii


Average Co-Inventor Count = 3.8

ph-index = 6

Forward Citations = 130(Granted Patents)


Location History:

  • Utica, MI (US) (1990 - 1997)
  • Sterling Heights, MI (US) (2002)

Company Filing History:


Years Active: 1990-2002

Loading Chart...
7 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Buddie R Dotter, II

Introduction

Buddie R Dotter, II is a notable inventor based in Utica, MI (US), recognized for his significant contributions to the field of vapor deposition technologies. With a total of 7 patents to his name, Dotter has made strides in developing advanced methods for thin film deposition, which are crucial in various industrial applications.

Latest Patents

Among his latest patents, Dotter has developed an "Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor." This invention includes a novel linear applicator that utilizes microwave enhanced chemical vapor deposition (CVD) to uniformly deposit thin films over elongated substrates. Another significant patent is for "Modified silicon oxide barrier coatings produced by microwave CVD." This method involves depositing a modified silicon oxide barrier coating on temperature-sensitive substrates, ensuring that the coating has excellent barrier properties against gaseous oxygen and water vapor. The process utilizes a precursor gaseous mixture that includes silicon-hydrogen, oxygen, and other elements like germanium, tin, phosphorus, and boron, with germanium being the preferred modifier.

Career Highlights

Throughout his career, Buddie R Dotter, II has worked with prominent companies such as Energy Conversion Devices, Inc. and Canon Inc. His experience in these organizations has contributed to his expertise in vapor deposition technologies and has allowed him to innovate in this specialized field.

Collaborations

Dotter has collaborated with notable professionals in his field, including Joachim Doehler and Lester R Peedin. These collaborations have likely enriched his work and contributed to the advancements in his patented technologies.

Conclusion

Buddie R Dotter, II stands out as an influential inventor in the realm of vapor deposition technologies. His innovative patents and career achievements reflect his dedication to advancing the field and his impact on industrial applications.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…