This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Thales. Active years: 2019.
Company Filing History:
Years Active: 2019
Title: Bruno Bluteau: Innovator in Critical Systems
Introduction
Bruno Bluteau is a notable inventor based in Arthez de Bearn, France. He has made significant contributions to the field of critical systems, particularly through his innovative patent. His work focuses on enhancing the control pathways of critical systems, which are essential in various technological applications.
Latest Patents
Bruno Bluteau holds a patent for a "Critical system and associated monitoring method." This invention involves a control pathway that includes an actuation unit characterized by nonlinear behavior. The actuation unit can be controlled by applying an input quantity, with its state defined by an output quantity. The system utilizes a flat nonlinear model to describe the actuation unit's behavior. It comprises an estimation unit with a dynamic inversion linearization module that calculates the input quantity of an equivalent linear model from the measured output quantity. Additionally, an estimation module estimates a flat output quantity based on the input quantity, while a computing module computes a residual based on the estimated and measured flat output quantities.
Career Highlights
Bruno Bluteau is associated with Thales, a leading company in the field of advanced technology and defense. His work at Thales has allowed him to apply his innovative ideas in practical settings, contributing to the development of critical systems that enhance operational efficiency and safety.
Collaborations
Bruno has collaborated with notable colleagues such as Alexandre Bobrinskoy and Olivier Guerineau. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Bruno Bluteau's contributions to the field of critical systems through his patent and work at Thales highlight his role as an innovator. His advancements in control pathways and monitoring methods are paving the way for future developments in technology.
