Sturbridge, MA, United States of America

Bruce M Pote

USPTO Granted Patents = 7 

Average Co-Inventor Count = 4.2

ph-index = 4

Forward Citations = 46(Granted Patents)


Company Filing History:


Years Active: 2000-2014

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7 patents (USPTO):Explore Patents

Title: Bruce M Pote: Innovator in Plasma Technology

Introduction

Bruce M Pote is a notable inventor based in Sturbridge, MA (US), recognized for his contributions to plasma technology. With a total of seven patents to his name, Pote has made significant advancements in the field, particularly in the development of systems that enhance the efficiency and functionality of plasma devices.

Latest Patents

Among his latest patents is the "Autonomous method and system for minimizing the magnitude of plasma discharge current oscillations in a hall effect plasma device." This innovative method involves iteratively measuring plasma discharge current oscillations and adjusting the magnet current to reduce these oscillations effectively. Another significant patent is the "Iodine fueled plasma generator system," which includes a plasma generator and a storage vessel for condensed phase iodine. This system is designed to create iodine vapor and manage its flow to the plasma generator, ensuring optimal performance through a feedback control subsystem.

Career Highlights

Bruce M Pote is currently associated with Busek Company, Inc., where he continues to push the boundaries of plasma technology. His work has not only contributed to the advancement of scientific knowledge but has also paved the way for practical applications in various industries.

Collaborations

Pote has collaborated with esteemed colleagues such as Vladimir J Hruby and James J Szabo, further enhancing the innovative environment at Busek Company, Inc. Their combined expertise has led to the development of cutting-edge technologies in plasma systems.

Conclusion

In summary, Bruce M Pote is a distinguished inventor whose work in plasma technology has resulted in several impactful patents. His contributions continue to influence the field and inspire future innovations.

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