Durham, CT, United States of America

Bruce E Truax


Average Co-Inventor Count = 1.8

ph-index = 4

Forward Citations = 89(Granted Patents)


Location History:

  • Plainsboro Township, Middlesex County, NJ (US) (1982)
  • Durham Township, Middlesex County, CT (US) (1982 - 1985)

Company Filing History:


Years Active: 1982-1985

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4 patents (USPTO):Explore Patents

Title: The Innovations of Bruce E. Truax

Introduction

Bruce E. Truax is a notable inventor based in Durham, Connecticut. He holds a total of four patents, showcasing his contributions to the field of technology and innovation. His work primarily focuses on advanced techniques in surface profiling and photomask fabrication.

Latest Patents

One of Truax's latest patents is a surface profiling technique that utilizes a narrow beam of light directed at a beamsplitter. This method involves varying the incident angle of the light beam to determine the distance of an object's surface from a reference plane. The reflected beams intersect at a reference plane, allowing for precise measurements of the surface profile as the object is moved incrementally. Another significant patent involves methods of fabricating a photomask, which is essential for forming patterns on semiconductor wafers. This photomask consists of a transparent baseplate with a thin metallic pattern and a coverplate in contact with it, ensuring high-quality pattern formation.

Career Highlights

Throughout his career, Bruce E. Truax has worked with prominent companies such as Western Electric Company, Inc. and AT&T Technologies, Inc. His experience in these organizations has contributed to his expertise in the field of technology and innovation.

Collaborations

Truax has collaborated with notable individuals, including Edward L. Banks and Laurence Shrapnell Watkins. These collaborations have likely enriched his work and expanded his impact in the industry.

Conclusion

Bruce E. Truax's innovative patents and career achievements highlight his significant contributions to technology. His work continues to influence advancements in surface profiling and photomask fabrication.

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