Bruce D Abel

Title: Bruce D Abel: Innovator in Photolithography Technology

Introduction

Bruce D Abel is a notable inventor based in Sayville, NY (US). He has made significant contributions to the field of photolithography, particularly in the production of extreme ultra-violet light. His innovative approach has implications for integrated circuit fabrication and other advanced technologies.

Latest Patents

Bruce D Abel holds a patent for a "Method and apparatus for adjustably supporting a light source for use in photolithography." This invention involves a method and apparatus for producing extreme ultra-violet light. It comprises a nozzle for flowing gas at a supersonic velocity, a source for directing a radiated energy beam into the flowing gas to stimulate emission of extreme ultra-violet light, and optionally a diffuser for capturing a substantial portion of the gas for recycling in a closed-loop system. The extreme ultra-violet light produced is suitable for use in photolithography applications. A remotely-controlled XYZ micro-positioning stage facilitates the alignment of the nozzle and diffuser to the radiated energy beam. Bruce D Abel has 1 patent to his name.

Career Highlights

Bruce D Abel is associated with Advanced Energy Systems, Inc., where he continues to develop innovative technologies. His work has been instrumental in advancing the capabilities of photolithography systems.

Collaborations

Throughout his career, Bruce has collaborated with notable professionals in the field, including Edwin Gerard Haas and Vincent A Christina. These collaborations have contributed to the development of cutting-edge technologies in photolithography.

Conclusion

Bruce D Abel is a distinguished inventor whose work in photolithography has paved the way for advancements in integrated circuit fabrication. His innovative methods and apparatus continue to influence the industry significantly.